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Title: Clear ethylene polymer emulsions having particle size less than 100 angstrom units and polishes containing the same
Claims: We claim: 1. A clear liquid polish composition comprising an aqueous dispersion of ethylene polymer particles in combination with dispersed particles of a resin, said resin being conventional in liquid polish compositions and said ethylene polymer particles comprising particles of a size of no larger than about 100 angstrom units prepared by polymerizing ethylene under a greater than atmospheric pressure by contacting gaseous ethylene with an aqueous medium maintained at an elevated temperature in the range of from about 70.degree.C to about 150.degree.C, said medium containing a water soluble salt of persulfuric acid as initiator in an amount effective to initiate polymerization, from about 2 to about 5 percent by weight of said aqueous medium of an anionic emulsifier, and from about 0.3 to about 0.7 percent by weight of said aqueous medium of an alkyl mercaptan having from about 4 to about 20 carbon atoms. 2. The clear liquid polish of claim 1 wherein said anionic emulsifier is a water soluble salt of an alkyl aryl sulfonate. 3. The clear liquid polish of claim 2 wherein said emulsifier is selected from sodium and potassium salts of alkyl benzene sulfonates wherein the alkyl group has from about 6 to about 18 carbon atoms. 4. The clear liquid polish of claim 1 wherein said alkyl mercaptan is a branched chain alkyl mercaptan having at least 10 carbon atoms. 5. The clear liquid polish of claim 4 wherein said alkyl mercaptan is present in an amount of about 0.4 weight percent of said aqueous medium. 6. The clear liquid polish of claim 5 wherein said alkyl mercaptan is tertiary dodecyl mercaptan. 7. The clear liquid polish of claim 1 wherein said ethylene is contacted with another alpha unsaturated monomer to form copolymer particles in said emulsion. 8. The clear liquid polish of claim 7 wherein said other alpha unsaturated monomer is selected from alkyl vinyl compounds having from about 3 to about 24 carbon atoms, vinyl organic acids, alkyl acrylate esters, styrenic compounds, disubstituted olefins, vinyl esters and mixtures thereof. 9. The clear liquid polish of claim 7 wherein said polymer comprises a terpolymer of ethylene, an acrylic compound, and one of said alkyl vinyl compounds. 10. In a clear liquid polish composition which has a light transmission of at least about 60 percent and which contains an aqueous dispersion of resin particles and other additives including those selected from leveling agents, plasticizers, and fluxes, the improvement comprising: a clear latex component admixed therein which latex has a light transmission of at least about 95% and comprises emulsion polymerized polymer particles selected from polymers and copolymers of ethylene which have an average size no larger than about 100 angstrom units, said polymer particles being formed by polymerizing ethylene under a greater than atmospheric pressure by contacting gaseous ethylene with an aqueous medium maintained at an elevated temperature in the range of from about 70.degree.C to about 150.degree.C, said medium containing a water soluble salt of persulfuric acid as initiator in an amount effective to initiate polymerization, from about 2 to about 5 percent by weight of said aqueous medium of an anionic emulsifier, and from about 0.3 to about 0.7 percent by weight of said aqueous medium of an alkyl mercaptan having from about 4 to about 20 carbon atoms. 11. The improved polish composition of claim 10 wherein said clear latex has a light transmission of at least about 99%. 12. The improved polish composition of claim 11 wherein said emulsifier is selected from sodium and potassium salts of alkyl benzene sulfonic acid wherein the alkyl group has from about 6 to about 18 carbon atoms. 13. The improved polish composition of claim 10 wherein said polymer in said clear latex is polyethylene. 14. The improved polish composition of claim 10 wherein said polymer in said clear latex is a copolymer of ethylene. 15. The improved polish composition of claim 14 wherein said copolymer comprises a copolymer of ethylene and an alpha unsaturated monomer selected from alkyl vinyl compounds having from about 3 to about 24 carbon atoms, vinyl organic acids, alkyl acrylate esters, styrenic compounds, disubstituted olefins, vinyl esters and mixtures thereof. 16. The improved polish of claim 15 wherein said copolymer is a terpolymer of ethylene, an acrylate compound, and an alkyl vinyl compound having from about 3 to about 24 carbon atoms. 17. The improved polish of claim 10 wherein said clear latex is contained therein in an amount ranging from about 5 to about 95 weight percent thereof. Other info: Inventors: Teer, Glenn E. (Big Spring, TX, US) Higgins, Jerry G. (Big Spring, TX, US) Warren, George D. (Big Spring, TX, US) Application Number: 540848 Filing Date: 1975-01-14 Publication_date: 1976-07-13 Assignee: Cosden Technology, Inc. (Big Spring, TX) Primary Class(es): 524/745 524/750, 524/855, 526/223, 526/224, 526/225, 526/318.6, 526/328.5, 526/339, 526/937 Other Classes: US Patent Ref: Other Refs:
Primary Examiner: Schofer, Joseph L. Assistant Examiner: Kulkosky, Peter F. Attorney: |
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