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Primary Examiner: Herbert, Jr., Thomas J.
Assistant Examiner:
Attorney: Walsh; Joseph G.

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Title: Positive resists containing dimethylglutarimide units

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Claims: What is claimed is:

1. A process for forming an image with a positive resist, said process comprising the steps of:

1. forming on a substrate a film of a composition comprising a polymer containing the structural unit ##EQU3## wherein R is H, CH.sub.3 or C.sub.2 H.sub.5,

2. exposing said film in a predetermined pattern to radiation,

3. removing the radiation exposed portion of said film with a solvent. 2. A process as claimed in claim 1 wherein the radiation is by means of an electron beam.

3. A process as claimed in claim 1 wherein the radiation is by means of light.

4. A process as claimed in claim 1 wherein R is hydrogen.

5. A process as claimed in claim 1 wherein R is CH.sub.3.

6. A process as claimed in claim 1 wherein R is C.sub.2 H.sub.5.

7. A process as claimed in claim 1 wherein the polymer is poly(dimethacrylimide).

8. A process as claimed in claim 1 wherein the polymer is a copolymer of dimethacrylimide and another vinyl type monomer.

9. A process as claimed in claim 1 wherein the polymer is a copolymer of dimethacrylimide and methyl methacrylate.

10. A process for the in situ preparation of a resist film, said process comprising heating a resist film containing dimethacrylic structures with ammonia, methyl amine or ethyl amine.

Other info:

Inventors: Bargon, Joachim (Los Gatos, CA, US)
Gipstein, Edward (Saratoga, CA, US)
Hiraoka, Hiroyuki (Los Gatos, CA, US)

Application Number: 615652
Filing Date: 1975-09-22
Publication_date: 1976-06-22
Assignee: International Business Machines Corporation (Armonk, NY)
Primary Class(es): 430/296 430/270.1, 430/326, 430/942, 522/3, 522/152
Other Classes:
US Patent Ref:

3535137	Oct, 1970	Haller et al.	427/44.
3887450	Jun, 1975	Gilano et al.	204/159.
3898350	Aug, 1975	Gipstein et al.	96/35.
3920618	Nov, 1975	Ichimura et al.	96/36.

Other Refs: 1,113,309

Aug, 1961	DT.

Other References: Chem. Abst., vol. 56, Mar. 1962, p. 6186(d).
Chem. Abstracts, vol. 65, 1966, p. 10680(d).