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Title:
Synthetic resin compositions containing 2,2,6,6-tetramethyl piperidyl ethers
Abstract:
Synthetic resin compositions of improved resistance to deterioration by heat and light are provided containing a 2,2,6,6-tetramethyl piperidyl ether having the formula: ##STR1## The compounds of the invention can be prepared by the reaction of the 2,2,6,6-tetramethyl piperidyl alcohol R1 -OH with (poly) trimethylol alkane, (poly) pentaerthritol, or an alcohol containing an oxetane ring, to form the ether. The etherification is carried out by the conventional method, for example, by the reaction of R1 -OH with the organic sulfonate of the above-mentioned alcohols, or by the reaction of R1 -OH with the halogenated above-mentioned alcohols in the presence of an alkali or acid acceptor. The compounds where n is equal to 2 or more can be prepared by chain opening polymerization of the corresponding compound containing the oxetane ring.
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Inventors:
Minagawa, Motonobu (Koshigaya, JP)
Kubota, Naohiro (Ageo, JP)
Kimura, Ryoji (Urawa, JP)
Application Number:
06/401481
Filing Date: 1982-07-26 Publication_date: 1983-12-27 Assignee:
ADEKA ARGUS CHEMICAL CO LTD (JP)
Primary Class(es):
524/99
546/207, 546/188, 546/190, 546/187, 524/117, 524/102, 5 Other Classes:
C08K5/3435; C08K5/00; C07D401/02; C08K5/34; C08K5/51
US Patent Ref:
| 3640928 | February, 1972 | Murayama et al. | 524/99 | | | 4128608 | December, 1978 | Minagawa et al. | 524/102 | 2,2,6,6-Tetramethyl-4-piperidyl spiro aliphatic ethers as stabilizers for synthetic polymers | | 4210577 | July, 1980 | Minagawa et al. | 524/102 | Stabilizers for synthetic polymers comprising 2,2,6,6-tetramethyl-4-piperidyl carboxylic acid ester, | | 4222931 | September, 1980 | Minagawa et al. | 524/102 | Stabilizers for synthetic polymers comprising 2,2,6,6-tetramethyl-4-piperidyl ether alcohol or ether | | 4234699 | November, 1980 | Rody et al. | 525/55 | Polymeric light stabilizers for plastics |
Other Refs:
Primary Examiner:
Kight III, John
Assistant Examiner:
Morgan, Kriellion
Attorney:
Browdy, And Neimark
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