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Title: Natural lithographic fabrication of microstructures over large areas

Abstract: Large area random and mosaic arrays of identical submicron microcolumnar structures can be produced on surfaces by directionally ion etching a monolayer film of spherical colloidal particles.


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Inventors: Deckman, Harry W. (Clinton, NJ)
Dunsmuir, John H. (Madison, NJ)

Application Number: 06/363019
Filing Date: 1982-03-29
Publication_date: 1983-10-04
Assignee: EXXON RESEARCH ENGINEERING CO (US)

Primary Class(es): 216/42 427/198, 257/E21.232, 204/192.340, 427/282, 216/67, 427
Other Classes: B41M5/24; G03F7/004; G03F7/16; H01L21/308; H01L21/02; C03C15/00; B44C1/22; H01L21/306; C03C25/06
US Patent Ref:
4254163March, 1981Piazza427/96Strippable resists
4315958February, 1982Peiffer et al.427/214Colloidal coating for small three dimensional articles, and particularly for fusion targets having g

Other Refs: Other References: U. Ch. Fischer and H. P. Zingsheim, J. Vac. Sci. Technol., 19(4), 881-885, Nov./Dec. 1981.
Appl. Phys. Lett., vol. 36, No. 9, May 1, 1980, A New Vacuum-Etched High-Transmittance (Antireflection) Film by Chris M. Horwitz, pp. 728-730.

Primary Examiner: Powell, William A.
Assistant Examiner:
Attorney: Hantman, Ronald D.
Parent Case Data:

This is a continuation-in-part of Ser. No. 336,036, filed on Dec. 31, 1981.