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Title:
Natural lithographic fabrication of microstructures over large areas
Abstract:
Large area random and mosaic arrays of identical submicron microcolumnar structures can be produced on surfaces by directionally ion etching a monolayer film of spherical colloidal particles.
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Inventors:
Deckman, Harry W. (Clinton, NJ)
Dunsmuir, John H. (Madison, NJ)
Application Number:
06/363019
Filing Date: 1982-03-29 Publication_date: 1983-10-04 Assignee:
EXXON RESEARCH ENGINEERING CO (US)
Primary Class(es):
216/42
427/198, 257/E21.232, 204/192.340, 427/282, 216/67, 427 Other Classes:
B41M5/24; G03F7/004; G03F7/16; H01L21/308; H01L21/02; C03C15/00; B44C1/22; H01L21/306; C03C25/06
US Patent Ref:
| 4254163 | March, 1981 | Piazza | 427/96 | Strippable resists | | 4315958 | February, 1982 | Peiffer et al. | 427/214 | Colloidal coating for small three dimensional articles, and particularly for fusion targets having g |
Other Refs:
Other References:
U. Ch. Fischer and H. P. Zingsheim, J. Vac. Sci. Technol., 19(4), 881-885, Nov./Dec. 1981.
Appl. Phys. Lett., vol. 36, No. 9, May 1, 1980, A New Vacuum-Etched High-Transmittance (Antireflection) Film by Chris M. Horwitz, pp. 728-730.
Primary Examiner:
Powell, William A.
Assistant Examiner:
Attorney:
Hantman, Ronald D.
Parent Case Data:
This is a continuation-in-part of Ser. No. 336,036, filed on Dec. 31, 1981.
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