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Title: Process for producing transparent electroconductive film

Abstract: A transparent electroconductive film of lower resistance with a smaller content of remaining organic components and less pinholes than those of the conventional transparent electroconductive film is produced by applying a coating solution selected from (a) a coating solution comprising an inorganic indium compound free from a photosensitive group in the molecule or an inorganic tin compound free from a photosensitive group in the molecule, an organic ligand, and an organic solvent, (b) a coating solution comprising an organic indium compound free from a photosensitive group in the molecule, or an organic tin compound free from a photosensitive group in the molecule, and an organic solvent, and (c) the coating solution (a) or (b) further containing a dopant to the surface of a substrate, thereby forming a film thereon, and then irradiating the substrate with radiation capable of exciting organic groups, for example, ultraviolet rays in a state where the substrate is kept at a high temperature (100°-600° C.), and then baking the substrate at a high temperature.


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Inventors: Okunaka, Masaaki (Fujisawa, JP)
Sudo, Ryoichi (Yokosuka, JP)
Yokono, Hitoshi (Yokohama, JP)
Isogai, Tokio (Fujisawa, JP)
Yamazaki, Mitsuo (Hitachi, JP)

Application Number: 06/215334
Filing Date: 1980-12-11
Publication_date: 1983-01-18
Assignee: HITACHI LTD (JP)
HITACHI CHEMICAL CO LTD (JP)

Primary Class(es): 427/558 522/181, 427/383.100, 522/182, 427/521, 427/383.500,
Other Classes: C03C17/27; C23C18/12; C23C18/14; H05K1/09; H05K3/02; C03C17/23; C23C18/00; B05D3/06
US Patent Ref:
4098922July, 1978Dinella et al.427/54.1Method for depositing a metal on a surface
4135959January, 1979Luo et al.427/54.1Method of manufacture of flat panel display device
4239787December, 1980Rentschler427/54.1Semitransparent and durable photolithography masks

Other Refs:
Primary Examiner: Smith, John D.
Assistant Examiner: Bell, Janyce A.
Attorney: Antonelli, Terry And Wands
Claims: