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Primary Examiner: Dixon, Harold A.
Assistant Examiner:
Attorney: Oblon, Fisher, Spivak, McClelland & Maier

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Title: Electron beam exposing apparatus

Abstract: Electron beam exposing apparatus includes first and second apertures to pass an electron beam and, a deflection device to change the incident position of the electron beam onto the second aperture to control a projected pattern configuration.

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Inventors: Sumi, Masahiko (Yokohama, JP)

Application Number: 005499
Filing Date: 1979-01-22
Publication_date: 1981-03-24
Assignee: Tokyo Shibaura Electric Company, Limited (Kawasaki, JP)
Primary Class(es): 250/492.2 250/396R
Other Classes:
US Patent Ref:

3876883	Apr, 1975	Broers	250/491.
4145597	Mar, 1979	Yasuda	250/396.

Other Refs: Other References: "New Imaging & Deflection"-by Pfeiffer, Journal of Vacuum Science Technology, vol. 12. No. 6, Nov./Dec. 1975, pp. 1170-1173.
"Automatic Stabilization of an Electron Probe"-by Doran et al. Journal Vacuum Science Technology, vol. 12, No. 6, Nov./Dec. 75, pp. 1174-1176.