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Title:
Arrangement and photometer for measuring and controlling the thickness of optically active thin layers
Abstract:
An arrangement and photometer for measuring and controlling the thickness of optically active thin layers wherein the axis of the measurement light beam coming from the measurement light source is directed to the measurement object and a referenced light receiver, independent of the optical properties of the measurement object, is associated with the measurement light beam. The output signal of the referenced light receiver is mixed with a trigger stage for a phase sensitive photometer amplifier and is fed to a compensation circuit for the equilization of brightness variations in the measurement light source.
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Inventors:
Schwiecker, Horst (Kahl am Main, DE, US) Thorn, Gernot (Hanau am Main, DE, US) Ehrl, Hans-Peter (Aufkirchen, DE, US)
Application Number:
807290
Filing Date: 1977-06-16 Publication_date: 1980-06-17 Assignee:
Leybold-Heraeus GmbH & Co. KG (DE)
Primary Class(es):
118/664
118/698, 118/712, 118/715
Other Classes:
US Patent Ref:
Other Refs:
1079920| Apr, 1960 | DE | | 1387607Mar, 1975 | GB. | | | | | | | |
Primary Examiner:
McIntosh, John P.
Assistant Examiner:
Attorney:
Sprung, Felfe, Horn, Lynch & Kramer
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