PatentVote.com: Vote on your favourite invention!


Primary Examiner: Bowers, Jr., Charles L.
Assistant Examiner:
Attorney: Frishauf, Holtz, Goodman & Woodward

Next ten patents ordered by date:
Process for forming a cyan dye image by the use of a 2-equivalent cyan coupler
Transfer printing on textile material
Alkali resistant, synthetic, mineral fibres
Expansive cement and agent therefor
Pigment compositions
CoO Free black spinel ceramic pigment containing NiO, Fe.sub.2 O.sub.3 and Cr.sub.2 O.sub.3
Powdery pearlescent pigment compositions
Admixture for obtaining rapid hardening portland cement and a method by which it is to be performed
Continuously operating centrifugal
Cleaning method for refining process rundown tank
Translate:
En
De
Es
Fr
It
Pt
Ja
Ko
Zh 

 

Title: Dry system image producing element

Abstract: There is disclosed a dry system image producing element comprising a substrate, a thin metal layer and a photosensitive layer. After exposing the element to light through a desired pattern, the photosensitive layer is peeled off to obtain a light barrier pattern made from the metal on the substrate corresponding to the photosensitized portion.


Do you think this is a good invention? Vote now:

 Votes so far: For:(0) Against:(0)
Other info:


Inventors: Moriya, Takeo (Kawagoe, JP)
Yamagata, Toshio (Urawa, JP)

Application Number: 934478
Filing Date: 1978-08-17
Publication_date: 1980-06-03
Assignee: Kimoto & Co., Ltd. (Tokyo, JP)
Primary Class(es): 430/306 430/78, 430/167, 430/253, 430/256, 430/277.1, 430/278.1, 430/302, 430/319, 430/323, 430/338, 430/494, 430/526, 430/544, 430/627
Other Classes:
US Patent Ref:
2560137Jul, 1951Slifkin96/75.
2729562Jan, 1956Zemp96/75.
2772160Nov, 1956Hepher96/91.
2810342Oct, 1957Neugebauer96/33.
2871119Jan, 1959Weegar et al.96/75.
3143418Aug, 1964Priest et al.96/75.
3744904Jul, 1973Loprest et al.96/67.
3748137Jul, 1973Worth et al.96/67.
3778270Dec, 1973Roos96/91.
4002478Jan, 1977Kokawa et al.96/68.
4008084Feb, 1977Ikeda et al.96/86.
4050936Sep, 1977Takeda et al.96/68.
4081282Mar, 1978Merrill et al.96/67.
4120722Oct, 1978Okamoto et al.96/86.

Other Refs: 10635591090663114836211515321215749
Mar, 1967GB.
Nov, 1967GB.
Apr, 1969GB.
May, 1969GB.
Dec, 1970GB.
Other References: Kirk, R. et al., "Encyclopedia of Chemical Technology," vol. 3, pp. 368, 374-375.
Chemical Abstracts, vol. 77, Abstract #95357y, 1972.
Chemical Abstracts, vol. 79, Abstract #99201g, 1973.
Chemical Abstracts, vol. 87, Abstract #192126m, 1977.
Chemical Abstracts, vol. 88, Abstract #30394r, 1978.
Dinaburg, M., "Photosensitive Diazo Compounds," 1964, The Focal Press, pp. 68-70, and 120-123.
Kosar, J., "Light-Sensitive Systems," 1965, J. Wiley & Sons, pp. 258-267.