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Primary Examiner: Newsome, John H.
Assistant Examiner:
Attorney: Riddles; Alvin J.

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Title: Sub 100A range line width pattern fabrication

Abstract: Sub-100A line width patterns are formed on a member by electron beam conversion and fixing of a resist that arrives at the reaction zone point by surface migration into a resist pattern of a precise thickness and width while the member rests on an electron backscattering control support. The resist is for example a contamination film from a vacuum pump oil used in evacuating the apparatus used to perform the process, e.g. silicone oil.

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Other info:

Inventors: Broers, Alec N. (Purdys Station, NY, US)
Cuomo, Jerome J. (Lincolndale, NY, US)
Laibowitz, Robert B. (Peekskill, NY, US)
Molzen, Jr., Walter W. (Patterson, NY, US)

Application Number: 011360
Filing Date: 1979-02-12
Publication_date: 1980-04-08
Assignee: International Business Machines Corporation (Armonk, NY)
Primary Class(es): 430/272.1 257/E21.03, 257/E21.259, 257/E21.26, 430/43, 430/314, 430/319, 430/494, 430/942
Other Classes:
US Patent Ref:

3056881	Oct, 1962	Schwarz	219/50.
3703402	Nov, 1972	Cole	427/43.
3961099	Jun, 1976	Gipstein et al.	427/43.
3964908	Jun, 1976	Bargon et al.	427/43.
3971860	Jul, 1976	Broers et al.	427/43.

Other Refs: Other References: Molzen et al. to be published in "Journ. Amer. Vac. Soc.," 1979.
Broers, "Microelectronics and Reliability," vol. 4 (1965), pp. 103-104.
Broers et al., "Proceedings Ninth International Congress on Electron Microscopy," vol. 3, pp. 343-354 (8-28-78). _
Broers et al., "American Institute of Physics," vol. 44 (1978), pp. 289-297.
Broers et al., "Applied Physics Letters," vol. 33, #5 (Sep. 1978), pp. 392-394.