Title: Chemical metering apparatus

Abstract: An apparatus for controlled dissolution and dispensing of a water treatment chemical including a chemical chamber disposed above a humidity chamber through which water flows at a controlled rate. A metering device controls the migration of moisture into the chemical chamber for dissolution of the chemical and for feeding of the chemical into the water passing through the humidity chamber. The water/chemical solution exiting from the humidity chamber enters into a settling chamber and is then directed to the water supply.

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Inventors: Abdoo, Alfred H. (Phoenix, AZ, US)

Application Number: 890248
Filing Date: 1978-03-27
Publication_date: 1979-12-18
Assignee:
Primary Class(es): 222/133 137/268
Other Classes:
US Patent Ref:

3093267	Jun, 1963	Lowery	222/133.
3401116	Sep, 1968	Stanwood	137/268.
3430823	Mar, 1969	Hunsaker	137/268.
3474817	Oct, 1969	Bates et al.	137/268.

Other Refs:
Primary Examiner: Knowles, Allen N.
Assistant Examiner:
Attorney: Haynes, Jr.; Herbert E.