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Title: Process and an apparatus for producing silicon carbide consisting mainly of beta-type crystal

Abstract: A process and an apparatus for producing silicon carbide consisting mainly of .beta.-type crystal are disclosed. The fine silicon carbide consisting mainly of .beta.-type crystal is produced by charging the starting material of silica and carbon with a mole ratio of C/SiO.sub.2 of 3.2-5.0 into a top portion of a vertical-type reaction vessel having a preheating zone, a heating zone and a cooling zone in this order, descending the starting material by gravity through the reaction vessel, heating the starting material in the heating zone at a temperature of 1,600.degree.-2,100.degree. C. by electrically indirect heating in horizontal direction to effect the formation of SiC, cooling the resulting reaction product in the cooling zone under a non-oxidizing atmosphere, and recovering the cooled product from the bottom portion of the reaction vessel to obtain a product having a composition ratio by weight of silicon carbide, silica and free carbon which lies within the area represented by the area ABCD shown in FIG. 1 of the accompanying drawings.


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Inventors: Enomoto, Ryo (Ohgaki, JP)
Yoshioka, Mitihiro (Yoro, JP)
Yokoyama, Takao (Ohgaki, JP)

Application Number: 797609
Filing Date: 1977-05-16
Publication_date: 1979-07-24
Assignee: Ibigawa Electric Industry Co., Ltd. (Gifu, JP)
Primary Class(es): 501/90 423/345
Other Classes:
US Patent Ref:
2178773Nov, 1939Benner et al.423/345.

Other Refs:
Primary Examiner: Vertiz, O. R.
Assistant Examiner: Bell, Mark
Attorney: Stevens, Davis, Miller & Mosher