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Title:
Process and an apparatus for producing silicon carbide consisting mainly of beta-type crystal
Abstract:
A process and an apparatus for producing silicon carbide consisting mainly of .beta.-type crystal are disclosed. The fine silicon carbide consisting mainly of .beta.-type crystal is produced by charging the starting material of silica and carbon with a mole ratio of C/SiO.sub.2 of 3.2-5.0 into a top portion of a vertical-type reaction vessel having a preheating zone, a heating zone and a cooling zone in this order, descending the starting material by gravity through the reaction vessel, heating the starting material in the heating zone at a temperature of 1,600.degree.-2,100.degree. C. by electrically indirect heating in horizontal direction to effect the formation of SiC, cooling the resulting reaction product in the cooling zone under a non-oxidizing atmosphere, and recovering the cooled product from the bottom portion of the reaction vessel to obtain a product having a composition ratio by weight of silicon carbide, silica and free carbon which lies within the area represented by the area ABCD shown in FIG. 1 of the accompanying drawings.
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Inventors:
Enomoto, Ryo (Ohgaki, JP) Yoshioka, Mitihiro (Yoro, JP) Yokoyama, Takao (Ohgaki, JP)
Application Number:
797609
Filing Date: 1977-05-16 Publication_date: 1979-07-24 Assignee:
Ibigawa Electric Industry Co., Ltd. (Gifu, JP)
Primary Class(es):
501/90
423/345
Other Classes:
US Patent Ref:
| 2178773 | Nov, 1939 | Benner et al. | 423/345. |
Other Refs:
Primary Examiner:
Vertiz, O. R.
Assistant Examiner:
Bell, Mark
Attorney:
Stevens, Davis, Miller & Mosher
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