Title: Apparatus for gas phase deposition of coatings

Abstract: Disclosed is an improved apparatus for depositing a coating on the internal surfaces of hollow articles by gas phase deposition. The apparatus typically includes a sheet metal enclosure having a manifold member which defines a first and second chamber therein. The first chamber is adapted to contain a powder mixture for generating a coating gas whereas the second chamber is adapted to house the articles to be coated. The manifold member includes hollow tubes or other connector means extending therethrough to connect the interior of the articles in gas flow relation to the first chamber where the coating gas is generated. A source external of the enclosure supplies carrier gas to the first chamber at a controlled flow rate via tube means. The carrier gas transports the coating gas generated in the first chamber through the manifold tubes and then into the internal passages of the article to effect deposition. The positive flow of coating gas through the internal passages provides a substantially uniform coating thickness over the entire internal surface area of each article.

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Inventors: Benden, Robert S. (Manchester, CT, US)
Parzuchowski, Richard S. (Bethel, CT, US)

Application Number: 836879
Filing Date: 1977-09-26
Publication_date: 1979-04-10
Assignee: United Technologies Corporation (Hartford, CT)
Primary Class(es): 118/715 427/237
Other Classes:
US Patent Ref:

573206	Dec, 1896	Chavez et al.	118/48.
3184348	May, 1965	Marinace	118/49.
3472679	Oct, 1969	In, Jr. et al.	118/49.
3558376	Jan, 1971	Schmidt et al.	118/49.
3594242	Jul, 1971	Burd et al.	118/49.
3617371	Nov, 1971	Burmeiste, Jr.	118/49.
3635771	Jan, 1972	Shaw	118/49.
3894164	Jul, 1975	Dismukes et al.	427/248.
4063974	Dec, 1977	Fraas	427/248.

Other Refs:
Primary Examiner: Reynolds, Wm. Carter
Assistant Examiner:
Attorney: Timmer; Edward J.