Title: Photocurable epoxy compositions containing thiopyrylium salts

Abstract: This invention relates to photocurable compositions comprising an epoxy resin and a catalytic amount of a photodecomposable thiopyrylium salt of the formula: ##STR1## WHERE R.sub.1, R.sub.2 and R.sub.3 are independently selected from the group consisting of hydrogen, alkyl containing 1 to 10 carbon atoms, cycloalkyl containing 5 to 12 carbon atoms, aryl containing 6 to 12 carbon atoms and substituted derivatives thereof, M is a metal or metalloid, X is a halogen radical, a is a whole number equal to 1 to 10 and n is a whole number equal to 1 to 3.

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Other info:

Inventors: Tsao, Jung-Tsien (Columbia, MD, US)

Application Number: 904156
Filing Date: 1978-05-09
Publication_date: 1979-02-13
Assignee: W. R. Grace & Co. (New York, NY)
Primary Class(es): 427/506 427/518, 427/520, 428/418, 430/270.1, 430/284.1, 430/285.1, 430/914, 522/31, 522/53, 522/170
Other Classes:
US Patent Ref:

3816278	Jun, 1974	Watt	204/159.
3936557	Feb, 1976	Watt	428/211.
4026705	May, 1977	Crivello et al.	96/27.
4069054	Jan, 1978	Smith	96/115.

Other Refs:
Primary Examiner: Turer, Richard B.
Assistant Examiner:
Attorney: Plunkett; Richard P., McDowell, Jr.; William W.