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Title:
Method of forming a curved implanted region in a semiconductor body
Abstract:
A method is disclosed whereby a region having a varying conductivity profile and depth is formed in a body of semiconductor material. The method includes the step of implanting conductivity modifiers beneath a curved surface of the body. Such a region, fabricated by the present method, is particularly useful as one element of a semi-conductor device.
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Inventors:
Ponczak, Samuel (Somerville, NJ, US) Olmstead, John Aaron (Somerville, NJ, US)
Application Number:
763721
Filing Date: 1977-01-28 Publication_date: 1978-09-12 Assignee:
RCA Corporation (New York, NY)
Primary Class(es):
438/524
257/625, 257/626, 257/E21.346, 257/E29.023, 257/E29.025, 438/343, 438/530
Other Classes:
US Patent Ref:
Other Refs:
Other References:
C. L. Bertin, "Lateral Transistor with Built-In Electric Field", IBM Tech. Disc. Bull. 16, (1973) 280. J. E. Ziegler et al., "Self-Isolating Bath-Tub Collector for a Planar Transistor", IBM Tech. Disc. Bull. 14, (1971) 1635. A. Lekholm et al., "Edge-Breakdown in Mesa Diodes", IEEE Trans. Electronic Devices, ED-18, (1971) 844. |