Title: Method of making curved color cathode ray tube shadow masks having interregistrable electron beam-passing aperture patterns

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Abstract: This disclosure depicts a low cost method of making curved color cathode ray tube shadow masks having interregistrable beam-passing aperture patterns. The method comprises providing flat mask master means and curved mask master means, the flat and curved master means having correlative master stencil patterns. Using the flat mask master means, there is photochemically formed in at least one side of a flat shadow mask blank a pattern of blind mask apertures whose individual blind aperture location is related to the end-product mask aperture location and whose individual blind aperture size, at least in a direction corresponding to the direction of electron beam scan across the mask, is greater than the desired end-product mask aperture size by a predetermined misregister tolerance value. The flat mask blank is precision-shaped into a predetermined three-dimensional configuration with the pattern of blind apertures referenced to indexing means defined by the mask. Using the curved mask master means, there is photochemically etched in the blank a pattern of through apertures coincident with the pattern of blind apertures but having individual through aperture size smaller by said predetermined tolerance value, at least in the said scan direction, than the blind apertures.


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