Title: Particle beam device with a deflection system and a stigmator

Abstract: A particle beam device is provided with an arrangement for eliminating deflection errors having a deflection system and a stigmator. The deflection system has at least two pairs of deflection means disposed in a single plane at right angles to each other. The two deflection means of each of the pairs are disposed diametrically opposite each other and are centered with respect to the beam axis. The stigmator has at least four pairs of field generating means grouped into two systems of two pairs each and the two field generating means of each of the pairs are likewise disposed diametrically opposite each other and centered with respect to the beam axis. The two systems are disposed in the single plane at right angles to each other and are arranged so that each of the systems forms an angle of 45.degree. with the two pairs of deflection means.

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Inventors: Anger, Klaus (Berlin, DT)

Application Number: 646669
Filing Date: 1976-01-05
Publication_date: 1978-05-16
Assignee: Siemens Aktiengesellschaft (Berlin & Munich, DT)
Primary Class(es): 250/396ML 250/396R
Other Classes:
US Patent Ref:

3150258	Sep, 1964	Wilska	250/39.
3371206	Feb, 1968	Takizawa	250/39.
3453485	Jul, 1969	Herrmann	250/39.
3644733	Feb, 1972	Wolff	250/39.

Other Refs:
Primary Examiner: Church, Craig E.
Assistant Examiner:
Attorney: Lerner; Herbert L.