Title: Multichamber vapor deposition process

Abstract: An apparatus and process are provided for the safe, economic and pollution-free exposure of articles to reactive gaseous fluids to alter their surface characteristics. The articles are exposed to one or more fluids which are transferred back and forth from a reaction chamber to a holding chamber. As the fluids are transferred they pass through a trap designed to remove reaction-by-products without affecting valuable reactant fluids. Since the fluids can be transferred under vacuum and the overall reaction can take place at relatively low temperatures, the process provides a convenient and safe method for handling reactive fluids. The process is particularly useful for the halogenation, for example fluorination, of a variety of articles, such as plastic containers, aerosol bottles and films to improve their barrier resistance to solvents and gases.

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Inventors: Hawkins, Albert W. (Princeton, NJ, US)
O'Hara, Matthew J. (Monroe, NY, US)
Gortsema, Frank P. (Croton, NY, US)
Hedaya, Eddie (White Plains, NY, US)

Application Number: 723030
Filing Date: 1976-09-13
Publication_date: 1978-03-28
Assignee: Union Carbide Corporation (New York, NY)
Primary Class(es): 427/237 427/248.1, 427/400
Other Classes:
US Patent Ref:

1937256	Nov, 1933	Taylor	118/50.
2222630	Nov, 1940	Pickford et al.	118/50.
2749255	Jun, 1956	Nack et al.	427/252.
2787688	Apr, 1957	Hall et al.	427/250.
3233579	Feb, 1966	Arvidsson	118/50.
3801360	Apr, 1974	Dahlgren	118/50.

Other Refs: 1,354,5611,188,896

Jan, 1964	FR
Mar, 1965	DT

Primary Examiner: Kaplan, Morris
Assistant Examiner:
Attorney: Moran; William Raymond