Title: Process control circuit for metal-depositing baths

Abstract: A process control circuit which is adapted for the control and monitoring of a plurality of parameters in one or more metal-depositing baths, has parameter control circuit blocks for each of the parameters to be measured. Each of the parameter control circuit blocks has a measuring stage for producing a measured value corresponding to one of the parameters, a calibration stage for calibrating the measuring stage, a comparison stage for comparing the measured value to a stored nominal value, and a dosing circuit which is connected to the comparator and which doses the metal-depositing bath in response to a comparison signal from the comparator.

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Inventors: De Steur, Hubert (Drongen, BE)
Pernegger, Wolfgang (Erlangen, DT)
Bussmann, Egon (Munich, DT)

Application Number: 688784
Filing Date: 1976-05-21
Publication_date: 1978-01-17
Assignee: Siemens Aktiengesellschaft (Berlin & Munich, DT)
Primary Class(es): 137/93 204/228.6
Other Classes:
US Patent Ref:

3361150	Jan, 1968	Horner	137/93.
3532102	Oct, 1970	Glassey	137/93.
3607549	Sep, 1971	Bielefel, Jr.	137/93.
3650196	Mar, 1972	Hosoe et al.	137/93.
3674672	Jul, 1972	Whitesell	137/93.

Other Refs:
Primary Examiner: Cline, William R.
Assistant Examiner:
Attorney: Hill, Gross, Simpson, Van Santen, Chiara & Simpson