Title: Method for enhancing solid solution stability of electron acceptor molecules and electrophotographic compositions

Abstract: Disclosed is a method for enhancing the resistance to crystallization of solid solutions containing electron acceptor molecules. According to this method, electron acceptor molecules are chemically modified whereby the resulting compound is capable of undergoing polymerization. This modified material is thereafter dissolved in a suitable polymeric resin and subsequently exposed to a source of activating energy thereupon causing such modified material to polymerize within the polymeric resin. The resulting composition exhibits enhanced resistance to crystallization and thus is suitable for use in electrophotographic devices and methods.

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Inventors: Turner, Sam R. (Webster, NY, US)
Pochan, John M. (Webster, NY, US)

Application Number: 615665
Filing Date: 1975-09-22
Publication_date: 1977-11-01
Assignee: Xerox Corporation (Stamford, CT)
Primary Class(es): 430/72 430/130, 430/902, 522/88, 522/116, 522/117, 522/121, 522/123, 522/136, 522/137, 522/142, 522/144
Other Classes:
US Patent Ref:

T884015	Mar, 1971	Staudenmayer et al.	96/1.
3647432	Mar, 1972	Holstead	96/1.
3752668	Aug, 1973	Baltazzi	96/1.
3759807	Sep, 1973	Osborn et al.	204/159.
3864126	Feb, 1975	Nishide et al.	96/1.
3867140	Feb, 1975	Hashimoto	96/1.
3994994	Nov, 1976	Stolka	96/1.
4007043	Feb, 1977	Stolka et al.	96/1.
4013623	Mar, 1977	Turner et al.	96/1.

Other Refs:
Primary Examiner: Martin, Jr., Roland E.
Assistant Examiner:
Attorney: Ralabate; James J., O'Sullivan; James P., Lyons; Ronald L.