Title: Black-body wafer support fixture for exposure of photoresist

Abstract: Photoresist coated transparent structures are supported in a black body (reflectionless) holder during activating exposure of the photoresist. When the photoresist coated structure is positioned in the holder, there is no reflecting surface close enough to the photoresist coated structure for photoresist-activating radiation which has once passed through the structure to be reflected back into the photoresist with sufficient intensity to expose the photoresist.

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Inventors: Lee, Soo N. (Irvine, CA, US)

Application Number: 632736
Filing Date: 1975-11-17
Publication_date: 1977-09-06
Assignee: Rockwell International Corporation (El Segundo, CA)
Primary Class(es): 355/43 355/77, 355/113, 430/322
Other Classes:
US Patent Ref:

1564821	Dec, 1925	Bornmann	354/288.
2155149	Apr, 1939	Rutherford	355/113.
2866704	Dec, 1958	Korkosz et al.	355/77.
3476476	Nov, 1969	Chitayat	355/86.
3620833	Nov, 1971	Gleim et al.	427/43.
3802102	Apr, 1974	Licciardi	355/113.
3844655	Oct, 1974	Johannsmeier	355/43.
3888673	Jun, 1975	Suzuki et al.	354/1.

Other Refs:
Primary Examiner: Griffin, Donald A.
Assistant Examiner:
Attorney: Hamann; H. Fredrick, Weber, Jr.; G. Donald, Ochis; Robert