Title: Method of forming groove pattern

Abstract: A method is given for obtaining recesses in a surface by etching. The obtained surface with recesses can be used for example in bearings. According to the invention, an etching method is given, wherein the depth of the recesses is controlled by forcing an etching fluid along the surface to be etched by means of a flow guiding template in places defined by this template. The etching rate in the recesses to be etched is controlled by adjustment of the flow velocity of the etching liquid and the slit height in the flow-guiding template. The recesses to be etched are deeper when the flow velocity of the etching fluid and the slit height are both higher.

Do you think this is a good invention? Vote now:

Votes so far: For:(0) Against:(0)
Other info:

Inventors: Hirs, Gilles Gerardus (Overath-Marialinden, DT)

Application Number: 614662
Filing Date: 1975-09-18
Publication_date: 1977-05-03
Assignee: Stichting Reactor Centrum Nederland (NL)
Primary Class(es): 216/54 216/90, 216/100, 216/108
Other Classes:
US Patent Ref:

3043362	Jul, 1962	Mennesson	156/345.
5751313	Aug, 1973	DiBenedetto et al.	156/16.

Other Refs:
Primary Examiner: Powell, William A.
Assistant Examiner:
Attorney: Cushman, Darby & Cushman