Title: Trifluorostyrene sulfonic acid membranes

Abstract: This disclosure is directed to fluorocarbon polymers, polymeric membranes, and electrochemical cells and processes. The polymers and membranes are produced by radiation techniques to provide improved products. For example, .alpha.,.beta.,.beta.-trifluorostyrene in an inert organic solvent is grafted onto an inert film, such as tetrafluoroethylene-hexafluoropropylene copolymer, by irradiation, i.e. with Co-60 gamma radiation at a dose of several Mrad. The grafted film is then sulfonated, preferably in a chlorosulfonic acid bath. The resulting film is useful as a membrane or diaphragm in various electrochemical cells such as chlor-alkali or fuel cells.

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Inventors: D'Agostino, Vincent F. (Huntington Station, NY, US)
Lee, Joseph Y. (Lake Grove, NY, US)
Cook, Jr., Edward H. (Lewiston, NY, US)

Application Number: 535636
Filing Date: 1974-12-23
Publication_date: 1977-03-15
Assignee: Hooker Chemicals & Plastics Corporation (Niagara Falls, NY); RAI Research Corporation (Hauppauge, NY)
Primary Class(es): 521/27 204/296, 522/5, 522/124, 525/276
Other Classes:
US Patent Ref:

3298942	Jan, 1967	Magat	204/159.
3341366	Sep, 1967	Hadgdon et al.	136/86.
3839172	Oct, 1974	Chapiro	260/884.
3878072	Apr, 1975	Cook	204/296.

Other Refs:
Primary Examiner: Mack, John H.
Assistant Examiner: Feeley, H. A.
Attorney: