Title: Nitrated polymers as positive resists

Abstract: Positive resists are made using polymers and copolymers of methacrylic acid, methacrylic anhydride, methyl methacrylate, methacrylimide, and N-alkyl-methacrylimides which have been nitrated in up to about 10% of the monomer units on the methyl groups branching off the polymer chain. Inclusion of the nitro groups results in an increase of over an order of magnitude in the speed of development of images when the polymers are used as positive resists.

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Inventors: Hiraoka, Hiroyuki (Los Gatos, CA, US)

Application Number: 616980
Filing Date: 1975-09-26
Publication_date: 1977-01-18
Assignee: International Business Machines Corporation (Armonk, NY)
Primary Class(es): 430/269 427/273, 427/552, 427/553, 430/296, 430/326, 430/942
Other Classes:
US Patent Ref:

3535137	Oct, 1970	Haller et al.	427/43.
3849137	Nov, 1974	Barzynski et al.	96/115.
3885964	May, 1975	Nacci	96/115.

Other Refs:
Primary Examiner: Newsome, John H.
Assistant Examiner:
Attorney: Walsh; Joseph G.