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Primary Examiner: Newsome, John H.
Assistant Examiner:
Attorney: Walsh; Joseph G.

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Title: Positive polymeric electron beam resists of very great sensitivity

Abstract: It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 .times. 10.sup..sup.-6 coulombs/cm.sup.2.

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Other info:

Inventors: Cortellino, Charles A. (Wappingers Falls, NY, US)
Gipstein, Edward (Saratoga, CA, US)
Hewett, William A. (Saratoga, CA, US)
Johnson, Duane E. (Los Gatos, CA, US)
Moreau, Wayne M. (Wappingers Falls, NY, US)

Application Number: 454058
Filing Date: 1974-03-25
Publication_date: 1976-12-07
Assignee: International Business Machines Corporation (Armonk, NY)
Primary Class(es): 430/296 427/273, 430/270.1, 430/286.1
Other Classes:
US Patent Ref:

3535137	Oct, 1970	Haller et al.	427/43.
3779806	Dec, 1973	Gipstein et al.	117/93.
3932352	Jan, 1976	Freedman et al.	260/45.

Other Refs: Other References: Bowden et al. "Journal of Applied Polymer Science" vol. 17 pp. 3211-3221 Oct. 1973.