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Primary Examiner: Herbert, Jr., Thomas J.
Assistant Examiner:
Attorney: Walsh; Joseph G.

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Title: Positive resists containing dimethylglutarimide units

Abstract: A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.

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Inventors: Bargon, Joachim (Los Gatos, CA, US)
Gipstein, Edward (Saratoga, CA, US)
Hiraoka, Hiroyuki (Los Gatos, CA, US)

Application Number: 615652
Filing Date: 1975-09-22
Publication_date: 1976-06-22
Assignee: International Business Machines Corporation (Armonk, NY)
Primary Class(es): 430/296 430/270.1, 430/326, 430/942, 522/3, 522/152
Other Classes:
US Patent Ref:

3535137	Oct, 1970	Haller et al.	427/44.
3887450	Jun, 1975	Gilano et al.	204/159.
3898350	Aug, 1975	Gipstein et al.	96/35.
3920618	Nov, 1975	Ichimura et al.	96/36.

Other Refs: 1,113,309

Aug, 1961	DT.

Other References: Chem. Abst., vol. 56, Mar. 1962, p. 6186(d).
Chem. Abstracts, vol. 65, 1966, p. 10680(d).