Title: Method of fabricating a charged couple radiation sensing device

Abstract: Method of fabricating an image sensing array, such as one of the charge coupled device (CCD) type, with a set of transparent insulated conductors over the image receiving surface. A transparent conductor layer on an insulated substrate surface is covered with a thin layer of aluminum. The desired pattern of electrodes is then defined in the aluminum by, for example, a photolithographic masking and etching process. The aluminum remaining is then anodically oxidized to form aluminum oxide, a transparent insulator. The portions of the transparent conductor not protected by the aluminum oxide are then removed and what remains are transparent conductors covered on top by transparent insulation.

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Inventors: Larrabee, Robert Dean (Princeton, NJ, US)

Application Number: 464971
Filing Date: 1974-04-29
Publication_date: 1976-03-02
Assignee: RCA Corporation (New York, NY)
Primary Class(es): 438/75 204/192.11, 204/192.26, 204/192.29, 205/122, 257/222, 257/E21.291, 257/E21.617, 257/E27.15, 257/E29.165, 257/E29.239, 438/98, 438/587, 438/588
Other Classes:
US Patent Ref:

3210214	Oct, 1965	Smith	156/13.
3294653	Dec, 1966	Keller et al.	156/13.
3436327	Apr, 1969	Shockley	117/212.
3615947	Oct, 1971	Yamada	156/11.
3668089	Jun, 1972	Chase et al.	156/3.
3808476	Apr, 1974	McCan, Jr.	357/24.
3813291	May, 1974	Joshi	156/17.
3836446	Sep, 1974	Tiefert	117/217.
3855112	Dec, 1974	Tomozawa et al.	156/3.

Other Refs:
Primary Examiner: Drummond, Douglas J.
Assistant Examiner: Massie, Jerome W.
Attorney: Christoffersen; H., Cohen; S.