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Primary Examiner: Powell, William A.
Assistant Examiner: Ball, Michael W.
Attorney: Jackson; David A., Bachman; Robert H.

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Title: Method of producing tarnish resistant copper and copper alloys and products thereof

Abstract: The instant invention comprises providing copper or a copper alloy which has on its surface a uniform glassy like and substantially pore free coating of copper phosphate, rinsing the coated material for at least two seconds in water at a pH of from 4.9 to 6.3, at a temperature of 90.degree.C to the boiling point and drying.


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Inventors: Caule, Elmer J. (New Haven, CT, US)

Application Number: 341404
Filing Date: 1973-03-15
Publication_date: 1976-03-02
Assignee: Olin Corporation (New Haven, CT)
Primary Class(es): 216/20 148/258, 156/316, 156/319, 216/48, 216/106, 430/313
Other Classes:
US Patent Ref:
3455751Jul, 1969Frantzen156/3.
3466207Sep, 1969Vincent252/79.
3620933Nov, 1971Grunwald et al.156/3.
3677828Jul, 1972Caule148/6.
3716427Feb, 1973Caule148/6.
3833433Sep, 1974Caule148/6.

Other Refs: 1,965,163
Nov, 1963JA
Other References: Photopolymer Resist System - Dupont Brochure A-60571 5/14/68.