|
|

|
|
Title:
Method of manufacturing a green light-emitting gallium phosphide device
Abstract:
A method of manufacturing a green light-emitting gallium phosphide device which comprises the steps of preparing a liquid-phase epitaxial solution of one conductivity type containing a high concentration of nitrogen at a higher temperature than 1000.degree.C; bringing said epitaxial growth solution now cooled to 600.degree.C to 1000.degree.C into contact with a gallium phosphide substrate of the same conductivity type as said solution; cooling said epitaxial growth solution to form a liquid-phase epitaxial layer on said substrate; and forming a region in close proximity to said liquid-phase epitaxial layer with the opposite conductivity type thereto.
Do you think this is a good invention? Vote now:
Votes so far: For:(0) Against:(0) Other info:
Inventors:
Beppu, Tatsuro (Tokyo, JA) Iwamoto, Masami (Yokohama, JA) Sekiwa, Tetsuo (Kawasaki, JA)
Application Number:
457649
Filing Date: 1974-04-03 Publication_date: 1976-01-27 Assignee:
Tokyo Shibaura Electric Co., Ltd. (Kawasaki, JA)
Primary Class(es):
438/46
117/56, 252/62.3GA, 252/950
Other Classes:
US Patent Ref:
Other Refs:
Other References:
Stringfellow, J. Electrochem. Soc.: Solid-State Science and Technology, Vol. 19, No. 12, Dec. 1972, pp. 1780-1782. |