Title: Liquid phase epitaxy

Abstract: A method of and a device for the epitaxial deposition of a layer on a monocrystalline substrate from a material in the liquid state, in which during the deposition process apportioned quantities of a second material are added to the said material in the liquid state, a jig being used having a plurality of vertically spaced, fixed and slidable walls for controlling the addition. Application inter alia for the provision of semiconductor layers, for example, of material of the type A.sup.III B.sup.V, in particular from mixed crystals.

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Inventors: Andre, Elie (Herouville Saint-Clair, FR)

Application Number: 535045
Filing Date: 1974-12-19
Publication_date: 1976-01-20
Assignee: U.S. Philips Corporation (New York, NY)
Primary Class(es): 118/421 117/56, 117/912
Other Classes:
US Patent Ref:

3565702	Feb, 1971	Nelson	148/172.
3664294	May, 1972	Solomon	118/415.
3665888	May, 1972	Bergh et al.	148/171.

Other Refs:
Primary Examiner: Kaplan, Morris
Assistant Examiner:
Attorney: Trifari; Frank R., Spain; Norman N.